Record Maximum Transconductance of 3.45 mS/μm for III–V FETs
نویسندگان
چکیده
This letter presents a self-aligned InGaAs quantumwell MOSFET with a transconductance, gm,max, of 3.45 mS/μm at Vds = 0.5 V. This is a record value among III–V FETs of any kind, including MOSFETs and HEMTs, and represents an improvement of over 10% with respect to the previous record on planar devices. This result was achieved by redesigning the access regions that link the intrinsic device to the source and drain contacts so as to increase their electron concentration. This mitigates the nonlinear increase of the access resistance at high current. This is often referred to as source starvation and leads to the loss of transconductance under strong ON conditions.
منابع مشابه
High Performance Deep-Submicron Inversion-Mode InGaAs MOSFETs with maximum Gm exceeding 1.1 mS/μm: New HBr Pretreatment and Channel Engineering
High performance deep-submicron inversion-mode InGaAs MOSFET with ALD Al2O3 as gate dielectric has been demonstrated. Transistors with gate lengths down to 150 nm have been fabricated and characterized. Record high extrinsic transconductance of 1.1 mS/μm has been achieved at Vds = 2.0 V with 5 nm Al2O3 as gate dielectric. Gm can be further improved to 1.3 mS/μm by reducing the gate oxide thickn...
متن کاملDependence of Electrical Properties of InAlN/GaN and InAlN/AlGaN/GaN Heterostructures FETs on the AlN Interlayer Thickness
We investigated the influence of the thickness of the AlN interlayer for InAlN/GaN and InAlN/AlGaN/GaN heterostructures. The AlN thickness strongly affects the surface morphology and electron mobility of the InAlN/GaN structures. The rms roughness of the surface increases from 0.35 to 1.2 nm with increasing AlN thickness from 0 to 1.5 nm. Large pits are generated when the AlN is thicker than 1 ...
متن کاملUltrashort channel silicon nanowire transistors with nickel silicide source/drain contacts.
We demonstrate the shortest transistor channel length (17 nm) fabricated on a vapor-liquid-solid (VLS) grown silicon nanowire (NW) by a controlled reaction with Ni leads on an in situ transmission electron microscope (TEM) heating stage at a moderate temperature of 400 °C. NiSi(2) is the leading phase, and the silicide-silicon interface is an atomically sharp type-A interface. At such channel l...
متن کاملInAs Quantum - Well MOSFET ( L g = 100 nm ) for Logic and Microwave Applications
We report a recessed quantum-well (QW) InAs MOSFET with enhancement-mode operation down to 100 nm gate lengths. The device features a composite insulator consisting of an MBE-grown 2 nm InP barrier plus an ex-situ ALD-deposited 3 nm Al2O3 for an estimated EOT of 2 nm. Our devices exhibit excellent short-channel effects down to the Lg = 100 nm regime. InAs QW MOSFETs exhibit record transconducta...
متن کاملGaAs Enhancement-Mode NMOSFETs Enabled by Atomic Layer Epitaxial La1.8Y0.2O3 as Dielectric
We demonstrate high performance enhancementmode (E-mode) GaAs NMOSFETs with an epitaxial gate dielectric layer of La1.8Y0.2O3 grown by atomic layer epitaxy (ALE) on GaAs(111)A substrates. A 0.5-μm-gate-length device has a record-high maximum drain current of 336 mA/mm for surface-channel E-mode GaAs NMOSFETs, a peak intrinsic transconductance of 210 mS/mm, a subthreshold swing of 97 mV/dec and ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2016